Aixtron
MOCVD systems, Atomic Layer Deposition, special deposition dedicated systems (SiGe, FeRAM, OLED, GaN...).

Veeco
ION Sourcers, DC-DC Hollow Cathode, Radio Frequency

Sentech
Plasma process technology for high precision etching and layer deposition in semiconductor and micro/nano applications : PLASMA ETCHER - RIE - ICPRIE PLASMA DEPOSITION - PECVD - ICPECVD

Lesker
Thin-film vacuum deposition systems , Vacuum chambers, Crystal Monitors to measure deposition rate and film thickness; Mass Flow Meters and Controllers for a variety of gasses and condensable vapors; and Power Supplies used for thin film processes includi

Laurell
Spin Coaters, Etching/Developing/Cleaning, Wet Stations, Rinser/Dryers

Diener
Plasma systems for cleaning, activation and deposition on surfaces in air and in vacuum