Home » Products »
Deposition ALD and CVD. ICP Plasma Etching
Aixtron
MOCVD systems, Atomic Layer Deposition, special deposition dedicated systems (SiGe, FeRAM, OLED, GaN...), Black Magic for graphene and CNT deposition.
Atomic Layer Deposition Sentech
Sentech manufacturers ALD (Atomic Layer Deposition) equipment both in thermal ALD and plasma ALD configuration to deposit oxides, nitries and metals.
Sentech
Plasma process technology for high precision etching and layer deposition in semiconductor and micro/nano applications :
PLASMA ETCHER - RIE - ICPRIE
PLASMA DEPOSITION - PECVD - ICPECVD
Lesker
Thin-film vacuum deposition systems , Vacuum chambers, Crystal Monitors to measure deposition rate and film thickness; Mass Flow Meters and Controllers for a variety of gasses and condensable vapors; and Power Supplies used for thin film processes includi
SPS Europe
Spin Coaters, Etching/Developing/Cleaning, Wet Stations, Rinser/Dryers